ʻO Alumina-Based Porous Ceramic Vacuum Chuck no ka lawelawe ʻana i ka wafer lahilahi
Hana ʻia ka chuck porous alumina a St.Cera mai ka 99.6% Al₂O₃ kiʻekiʻe-maʻemaʻe me ka porosity hāmama i kāohi ʻia o 30-45% a me ka nui o ka pore like mai 10 a 50 μm. ʻAʻole e like me nā chucks grooved, hāʻawi ka ʻili porous i ka vacuum i hoʻolaha ʻia ma ka ʻaoʻao hope o ka wafer holoʻokoʻa, e hoʻopau ana i ka māka lihi a hiki ke paʻa mālie i nā wafers ultra-thin (≤100 μm) a i ʻole warped. Hāʻawi ka mea i ka ikaika flexural ≥250 MPa a me ke kūpaʻa thermal a hiki i 400°C i ka lewa.
Nā kikoʻī(ma muli o 99.6% Al₂O₃):
| Waiwai | Waiwai |
| Mea Hana | 99.6% Alumina (Keʻokeʻo) |
| Ka porosity | 30–45% (hiki ke hoʻololi ʻia) |
| Ka nui o nā poho awelika | 10–50 μm |
| Ikaika Flexural | ≥250 MPa |
| Ka nui o ka paʻa | 3.88 g/cm³ |
| Palahalaha (ma luna o 200mm) | ≤5 μm |
| Mahana Hana Loa | 400°C (ea) |
| Hoʻopau ʻili | Hoʻopaʻa ʻia (Ra ≤0.8 μm) |
Nā noi:
- · Wili ʻaoʻao hope o ka wafer lahilahi (≤50 μm)
- · Ke kau ʻana o ka wafer warped no ka dicing
- · Ka ʻohi ʻana i ka make hoʻokahi
- · Ka lawelawe ʻana i ka substrate aniani
Hana ʻana:
Pauka i kāwili ʻia me nā mea hana pore → kaomi isostatic → sintering ma 1600°C → lapping a hiki i ka mānoanoa hope loa. Hoʻāʻo ʻia kēlā me kēia chuck no ke ʻano like o ka vacuum (ka ʻokoʻa o ke kaomi <5%) a nānā ʻia no ka hoʻolaha ʻana o ka nui o ka pore (SEM).
Nā pōmaikaʻi ma mua o nā chucks maʻamau:
- · ʻAʻohe māka wafer backside a i ʻole ka hoʻololi make
- · Paʻa i nā wafers me ke kakaka a hiki i 500 μm
- · ʻIli hoʻomaʻemaʻe ponoʻī (pale nā pores i ke pani ʻana)
- · Hoʻopau ke kākoʻo like i ke kaumaha kūloko
Choʻohana pono ʻana:
Nā ʻano poepoe a huinahā paha, ke anawaena 100–450 mm. Loaʻa ke apo sila lihi no ka kaohi ʻana i ka mīkini hoʻomaʻemaʻe ʻāpana.
E noi i kahi hāpana no ka nui o kāu wafer kikoʻī.
