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ʻO ka lima robot seramika alumina kiʻekiʻe-maʻemaʻe no ka lawelawe ʻana i ka wafer
Ua hana ʻia ka lima lopako keramika alumina a St.Cera me ka pololei mai ka 99.8% Al₂O₃ kiʻekiʻe-maʻemaʻe (alumina). Hoʻohui ia i ka ikaika flexural kūikawā (361 MPa), ka paʻakikī kiʻekiʻe (16 GPa), a me ka haʻahaʻa haʻahaʻa (3.93 g/cm³), e hopena ana i kahi lima māmā akā paʻa no ka hoʻoili wafer semiconductor. Hoʻohālikelike pono ka coefficient hoʻonui wela o ka mea (7.2 × 10⁻⁶/°C) me ka silicon, e hoʻemi ana i ka mismatch thermal i ka wā o ka hana ʻana.
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ʻO Bernoulli Ceramic End Effector — Ka lawelawe ʻana i ka Wafer Non-Contact no nā Wafers Lahilahi a Palupalu
Hoʻohana ka mea hoʻokō hopena keramika Bernoulli a St.Cera i ka hāpai aerodynamic e lawelawe i nā wafers me ka ʻole o ka hoʻopili kino. Hana ʻia mai ka 99.8% alumina (Al₂O₃) a i ʻole silicon carbide (SiC) maʻemaʻe kiʻekiʻe, hōʻike ia i nā nozzles mīkini kikoʻī e hoʻokuke i ke kinoea i hoʻopaʻa ʻia e hana i kahi ʻili ea lahilahi ma waena o ka mea hoʻokō hopena a me ka wafer. Hoʻopau kēia kumumanaʻo pili ʻole i ka haumia ma hope, ka ʻoki ʻana o ka lihi, a me ka hōʻino ʻana o ka ʻili, e kūpono ia no nā wafers lahilahi (≤100 μm), palupalu, a i ʻole nā wafers warped. Hāʻawi ka substrate keramika i ka ikaika flexural kiʻekiʻe (361 MPa no Al₂O₃; a hiki i 550-600 MPa no SiC), ka nuipa haʻahaʻa, a me ke kūpaʻa dimensional maikaʻi loa, e hōʻoia ana i ke kūlana hana hou ʻia i nā robots hoʻoili wafer wikiwiki kiʻekiʻe.
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ʻO ka hopena keramika i uhi ʻia me ka Teflon - ʻIli ʻAʻole e Piʻi no ka lawelawe ʻana i ka wafer koʻikoʻi
Hoʻohui ka mea hoʻokō hopena keramika i uhi ʻia me ka Teflon (PTFE) a St.Cera i kahi substrate alumina ikaika kiʻekiʻe me kahi uhi PTFE like, haʻahaʻa-friction (mānoanoa 15-30 μm). Hāʻawi ka uhi i kahi coefficient haʻahaʻa loa o ka friction (≤0.1), ke kūpaʻa kemika maikaʻi loa, a me nā waiwai ʻaʻole e pipili, e pale ana i ka hoʻopili ʻana o ka wafer a hoʻopau i ka haumia o ka ʻaoʻao hope. Hāʻawi ka substrate keramika ma lalo (99.8% Al₂O₃) i ka ikaika flexural kiʻekiʻe (361-1000 MPa), ke kūpaʻa ʻaʻahu, a me ke kūpaʻa wela a hiki i 260°C (palena uhi). He kūpono kēia mea hoʻokō hopena no ka lawelawe ʻana i nā wafers palupalu, lahilahi, a pipili paha (e laʻa, ma hope o ka uhi photoresist a i ʻole nā kaʻina hana kemika).
