ʻO ka lima robot seramika alumina kiʻekiʻe-maʻemaʻe no ka lawelawe ʻana i ka wafer
Ua hana ʻia ka lima lopako keramika alumina a St.Cera me ka pololei mai ka 99.8% Al₂O₃ kiʻekiʻe-maʻemaʻe (alumina). Hoʻohui ia i ka ikaika flexural kūikawā (361 MPa), ka paʻakikī kiʻekiʻe (16 GPa), a me ka haʻahaʻa haʻahaʻa (3.93 g/cm³), e hopena ana i kahi lima māmā akā paʻa no ka hoʻoili wafer semiconductor. Hoʻohālikelike pono ka coefficient hoʻonui wela o ka mea (7.2 × 10⁻⁶/°C) me ka silicon, e hoʻemi ana i ka mismatch thermal i ka wā o ka hana ʻana.
Nā kikoʻī (ma muli o 99.8% Al₂O₃):
| Waiwai | Waiwai |
| Waihoʻoluʻu | ʻAipoe |
| Ka nui o ka paʻa | 3.93 g/cm³ |
| Ikaika Flexural | 361 MPa |
| Paʻakikī Vickers | 16 GPa |
| Modulus o Young | 380 GPa |
| Ka Hoʻokele Wela | 32 W/m·k |
| Hoʻonui Wela | 7.2×10⁻⁶/℃ |
| Ikaika Dielectric | 15×10⁶ V/m |
Nā noi:
- Nā lopako hoʻoili wafer vacuum (200mm/300mm)
- Nā ʻōnaehana lawelawe lewa
- Nā lima hoʻopau hopena no ka hana automation FAB
Kaʻina Hana Hana:
Kaomi ʻana o Isostatic → mīkini ʻōmaʻomaʻo → sintering ma 1600°C → wili pololei CNC → hoʻomaʻemaʻe ultrasonic → ʻōpala lumi maʻemaʻe Papa 100. Nānā ʻia kēlā me kēia lima e 100% e CMM no ka palahalaha (±0.01 mm) a me ka ʻoʻoleʻa o ka ʻili (Ra ≤0.4 μm).
Mana Hoʻomalu Kūlana:
Ua hōʻoia ʻia ʻo St.Cera e ISO 9001:2015. Hana mākou i ka hoʻāʻo penetrant dye no nā micro-cracks, ke kūlou ʻekolu-kiko no ka ikaika flexural, a me ka hoʻāʻo ikaika dielectric e like me ASTM D149.
Nā Pōmaikaʻi ma luna o nā Lima Metala:
- 50% māmā ma mua o ke kila kila
- ʻAʻohe pala galvanic
- Hana ʻāpana haʻahaʻa (≤0.05 mau ʻāpana/cm²)
- Loaʻa ka uhi palekana ESD (10⁶–10⁹ Ω/sq)
Hoʻopilikino ʻana:
ʻO ka lōʻihi mai 150mm a 450mm, nā ʻano o ka piko (ka paʻa ʻana o ka ʻaoʻao, Bernoulli, vacuum), a me nā ʻano hoʻohālikelike o ka flange e like me nā kiʻi OEM. Nā hoʻohālike i loko o 2 mau pule.
No nā kauoha nui, e ʻoluʻolu e noi i kahi ʻōlelo kūʻai.
