Apo Seramika Alumina Maʻemaʻe Kiʻekiʻe no nā Keʻena Hana CVD / PVD

Ua hoʻolālā kūikawā ʻia ke apo keramika a St.Cera no ka hoʻohana ʻana i loko o nā keʻena hana CVD (Chemical Vapor Deposition) a me PVD (Physical Vapor Deposition). Hana ʻia mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃), lawelawe kēia apo ma ke ʻano he liner keʻena, apo focus, a i ʻole ka ʻāpana kit hana e hoʻopaʻa i ka plasma a pale i nā paia o ke keʻena mai ka erosion. Hāʻawi ka mea i ke kūpaʻa plasma maikaʻi loa, ka ikaika dielectric kiʻekiʻe (15 × 10⁶ V/m), a me ke kūpaʻa wela a hiki i 1600 °C, e hōʻoiaʻiʻo ana i ke ola lawelawe lōʻihi i nā wahi plasma fluorine-based aggressive. ʻO nā hoʻomanawanui dimensional pololei (± 0.05 mm ma ID/OD) a me ka flatness (≤10 μm) e hiki ai ke hoʻonohonoho mau i ka lihi wafer, e hoʻomaikaʻi ana i ka like ʻana o ka deposition a me ka hōʻemi ʻana i ka hanauna ʻāpana.

Nā kikoʻī (ma muli o 99.8% Al₂O₃):

Nā noi:

• · Nā apo hoʻoikaika o ke keʻena CVD a me nā apo lihi
• · Nā apo pale keʻena PVD a me nā apo paʻa
• · E hoʻopaʻa i nā liners keʻena a me nā apo uhi
• · Nā apo hoʻopaʻa plasma i nā ʻōnaehana etch dielectric

Kaʻina Hana Hana:

Kaomi ʻana o Isostatic → mīkini ʻōmaʻomaʻo → sintering ma 1600°C → wili CNC ID/OD → lapping ʻili → hoʻomaʻemaʻe ultrasonic → nānā ʻana o 100% CMM. Hoʻemi ka hoʻopau ʻana o ka ʻili laumania loa (Ra ≤0.4 μm) i ka hoʻopili ʻana o nā ʻāpana.

Mana Hoʻomalu Kūlana:

• · Nānā 100% dimensional (ID, OD, mānoanoa, pālahalaha)
• · Nānā ʻana i ka dye penetrant no nā micro-māwae o ka ʻili
• · Hoʻāʻo ikaika dielectric e like me ASTM D149
• ʻAʻohe ʻike ʻia ke kala ʻole a i ʻole ka porosity ma lalo o ka microscope 20×

Nā Pōmaikaʻi ma luna o nā Apo Metala a i ʻole Quartz:

• · 5–10× ʻoi aku ka lōʻihi o ke ola ma mua o nā apo alumini i loko o ka plasma fluorine
• ʻAʻohe haumia metala i loko o nā ʻili lahilahi
• ʻOi aku ke kūpaʻa plasma ma mua o ka quartz (ʻaʻohe lua erosion)
• · Mālama i ka pale uila >10¹⁴ Ω·cm ʻoiai ma hope o ka hoʻohana lōʻihi

Mea ʻē aʻe — Silicon Nitride (Si₃N₄):

No nā noi e koi ana i ka paʻakikī haki kiʻekiʻe aʻe (6.2 MPa·m¹/²) a me ke kūpaʻa haʻalulu wela maikaʻi (coefficient hoʻonui 3.2 × 10⁻⁶/℃), loaʻa nā apo Si₃N₄. Eia nō naʻe, ʻoi aku ka maikaʻi o ke kumukūʻai o ka alumina no ka hapa nui o nā noi CVD/PVD. E ʻoluʻolu e kuhikuhi i ka makemake o ka mea i ke kauoha ʻana.

Hoʻopilikino ʻana:

• · Nā lua ma waena, nā ʻaoʻao hehi, a i ʻole nā ​​​​​​pākuʻi no ke kau ʻana
• · ʻIli i uhi ʻia me Y₂O₃ no ka hoʻoikaika ʻana i ke kūpaʻa plasma (koho)
• · Ke kaha kiʻi laser o ka helu ʻāpana / code lot

Hoʻomaopopo:Ua hahai pono ka ʻikepili ma luna i ka papa waiwai Al₂O₃ i hāʻawi ʻia. No nā apo Si₃N₄, e nānā i ka pepa ʻikepili Si₃N₄ kaʻawale i hāʻawi ʻia.