ʻO ke kumu seramika alumina maʻemaʻe kiʻekiʻe no nā mea hoʻopaʻa semiconductor
ʻO ke kumu keramika alumina a St.Cera he kikoʻī i hana ʻia mai ka 99.8% Al₂O₃ kiʻekiʻe-maʻemaʻe, e hāʻawi ana i ka ikaika dielectric kūikawā (15 × 10⁶ V / m), ke kūpaʻa wela a hiki i 1600 ° C, a me ke kūpaʻa kolo ma lalo o ke kaumaha. Hoʻohana ʻia kēia mau kumu ma ke ʻano he mau ʻāpana kūkulu i nā mea hana hana wela kiʻekiʻe, nā kumu hoʻomehana, nā liner keʻena plasma, a me nā mea hoʻokaʻawale uila. ʻO ka paʻakikī kiʻekiʻe o ka mea (16 GPa) a me ka omo wai haʻahaʻa (0%) e hōʻoia i ka hilinaʻi lōʻihi i nā wahi ʻino.
Nā kikoʻī(ma muli o 99.8% Al₂O₃):
| Waiwai | Waiwai |
| Mea Hana | 99.8% Alumina (ʻAiwi ʻelepani) |
| Ka nui o ka paʻa | 3.93 g/cm³ |
| Ikaika Flexural | 361 MPa |
| Paʻakikī o ka haki | 3–4 MPa·m¹/² |
| Paʻakikī Vickers | 16 GPa |
| Modulus o Young | 380 GPa |
| Ka Hoʻokele Wela | 32 W/m·k |
| Hoʻonui Wela (25-1000°C) | 7.2×10⁻⁶/℃ |
| Ikaika Dielectric | 15×10⁶ V/m |
| Ke kū'ē kiko'ī | >10¹⁴ Ω·mm²/m |
| Mahana Hana Loa | 1600°C |
Nā noi:
- · ʻO ke kumu hoʻomehana no nā reactors epitaxial
- · ʻO ka uhi o ke keʻena plasma a me nā papa uhi
- · Nā mea hoʻokaʻawale uila kiʻekiʻe
- · Kumu paʻa no nā robots lawelawe wafer
Hana ʻana:
Kaomi Isostatic → mīkini ʻōmaʻomaʻo → sintering ma 1600°C → wili CNC i nā ana hope loa (± 0.01 mm tolerance). Nānā ʻia kēlā me kēia ʻiwi e CMM a me ka ʻike ʻana i nā kīnā ultrasonic.
Hōʻoiaʻiʻo Kūlana:
Hōʻoia ʻia ʻo ISO 9001:2015. Hoʻāʻo komo ʻana o ka dye no nā māwae ʻili; hoʻāʻo ikaika dielectric e like me ASTM D149.
ANā pōmaikaʻi ma mua o nā keramika ʻē aʻe:
- · ʻOi aku ka ikaika dielectric ma mua o ka zirconia (15 vs <10 × 10⁶ V/m)
- · ʻO ke kumukūʻai haʻahaʻa ma mua o SiC no nā noi plasma ʻole
- · Kū'ē kemika maika'i loa i nā halogens (koe na'e ʻo HF)
Nā ʻAno Maʻamau:
Nā paukūʻolokaʻa, nā kaola huinahā, nā papa, a i ʻole nā ʻano hana paʻakikī. ʻO ka nui o nā hiʻohiʻona liʻiliʻi loa he 0.5 mm.
E kāhea mai iā mākou no nā hoʻolālā koʻikoʻi maʻamau a me ke kākoʻo hoʻohālike thermal.
